Big data to optimize the process parameters for production of simple LED Taiwan Taiwan

In the light emitting diode (LED) epitaxial process complex, parameters of gas composition and flow rate, pressure, substrate temperature and speed will influence, usually takes a long time to set up and adjust the epitaxial parameters, based on past experience, do a set of parameters need 6 to 8 hours, find the optimal process parameters often spend a week, and must rely on years of experience to estimate the epitaxy process parameter setting, in order to obtain better yield, so the "person" has become the key to the rate.

How to make the experience become reference data for simulation, Taiwan will try to import the ITRI experimental parameters of massive database, through the optimization of relevant parameters, save process development verification time, developed a "system" to optimize the parameters of epitaxial process, through the establishment of knowledge system, can also shorten the cultivation time of the relevant personnel.

ITRI R & D epitaxy process parameters optimization system is by metal organic chemical vapor deposition equipment (MOCVD) flow, heat flux, chemical reaction mechanism and gas spray head key module and integration technology, a breakthrough of the traditional epitaxial plant to find the optimum process parameters. The process of digital epitaxy manufacturing technology, which is imported into ECOS (Epitaxy Optimum Coupling System) and the integrated system (Cyber-Physical System CPS). In this system, the "entity" part refers to the combination of the machine and the process of the gas spray module. By ITRI testing of R & D team has been able to grasp the gas spraying process parameters and performance module, database operation mode and parameter regulation accuracy.

Through this development process, not only improve the accuracy, epitaxial parameters determine the time from the original one week shortened to less than 2 hours, through the experience of numerical value, also will affect the personnel changes caused by the process to a minimum.

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