SUSS MicroTec launched a dedicated lithography system for the LED Market

For automatic production of lithography MA100e Gen high brightness LED 2 come out

June 8, 2010 Munich, SUSS MicroTec, the well-known global semiconductor industry and related equipment and technology solutions provider, launched a new generation of MA100e lithography, dedicated to high brightness light-emitting diode (HB-leds) production. MA100e based on the classic design of SUSS MicroTec lithography, with a maximum capacity of 4 inches of the film, an output of up to 145 per hour, the industry leader.

The demand for LED backlight, such as televisions and monitors, is growing rapidly, and LED equipment manufacturers must try their best to meet the needs of the market. LED industry is very sensitive to the cost, so the design of the SUSS MA100e Gen2 MicroTec automatic lithography is very competitive in terms of cost control. High intensity light path and pre alignment system greatly shorten the operation time of equipment configuration, function of proximity lithography resolution up to 2.5um, which greatly improves the yield and cost efficiency. MA100e Gen2 provides superior process scalability, allowing users to quickly enter the market for new chip design.

SUSS MicroTec Frank president and chief executive officer Mr. Averdung pointed out: "we clearly recognize that the tip of high brightness light-emitting diode technology growing demand, and see the LED industry to reduce costs and to begin the development of highly automated direction. SUSS MicroTec development of a new generation of MA100e is designed specifically for the production of LED efficient automatic lithography machine, can help our users to reduce the cost per lumen, improve production efficiency. "