Recently, Samsung announced the successful development of amorphous oxide TFT (Amorphous Oxide TFT) technology, can be used for the next generation semiconductor display device.
Amorphous oxide TFT technology can be used as an alternative technology of amorphous silicon technology, can effectively reduce production costs, without loss of image quality. Can be used in LCD TV, AM OLED, thin film solar cells, LED and sensors and other products.
Samsung in the 15 days of this month the opening in San Francisco of the International Conference on electronic devices IEDM 2008 show this new technology, channel structure design of this technology can make the electronic movement reached 130? /V? Sec, is 3 times the single channel current structure of the TFT oxides. The improvement of electronic motion can effectively improve the screen quality and display ability of semiconductor display device.
With the development of flat panel display beyond the full HD standard to ultra high definition UD level, this large capacity information processing capacity is also possible. Furthermore, the driving voltage of the TFT can be controlled by connecting to a variety of semiconductor sensors. More importantly, the amorphous oxide TFT technology can be produced through the transformation of the existing LCD panel production line, effectively reducing the cost of transformation.
Samsung also hopes that this new technology can be widely used as a liquid crystal panel AM OLED, flexible displays, transparent displays, solar cells, LED and sensors and other products. Samsung executive director Kim, Yung-hwan said, in the long run, this technology will become the key technology in the future display. "
In addition, in May this year, Samsung SDI has developed the world's first application of amorphous oxide TFT technology best resolution AM OLED panel.
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