GaN LED glass substrate transient luminescence

March 19, 2007, Australia BluGlass company claimed to observe GaN LED transient luminescence glass substrate.

BluGlass's research team developed a plasma deposition method can work at 700 C, lower than the operating temperature of the MOCVD method of nearly 300 degrees C, no need to use ammonia. The deposition method can be used to produce high uniformity nitride films on 4 inch glass substrates, and the performance on the 6 inch substrate is also good. BluGlass has proved a continuous wavelength node in heterogeneous sapphire substrate using low temperature deposition process, which has the similar structure of the glass substrate (provided by Saint-Gobain) GaN LED also observed the transient luminescence.

BluGlass is eager to be able to promote this technology, greatly reducing the manufacturing cost of LED. In the next few weeks, BluGlass will be a global tour speech, to the world's major LED providers to introduce the technology and its low cost advantage compared with the MOCVD method.