Government to promote the use of LED lighting industry

Let the cost down, so that technology is mature industry chain. The upper, middle and lower reaches of the LED industry chain are used for epitaxial material and chip processing, product components and module packaging, display and lighting applications.

LED epitaxial wafer and chip industry accounted for about 70% of the profits, LED packaging accounted for about 10%~20%, LED applications accounted for about 10%~20%. According to statistics, the production of semiconductor lighting enterprises in China more than 3000, 70% of which focus on the industry downstream, domestic LED epitaxial material, chip with low power LED chip, and more than 80% devices rely on imports.

In recent years, the government has built a number of LED pepper lighting industry base, but China's LED industry is still at the expense of 70% of the country's 10%~20% share of the profits of LED. This means that the control of the core technology of LED foreign companies if not to pull LED low cost, simple LED downstream of the Chinese LED industry only to achieve low-cost and allow the market to heat up to sacrifice their own profits, but not the downstream products of technical support, if the price is cheaper, and how many people dare to use.

In addition, the development of LED lighting technology, in addition to its resistance to heat and specifications, price and other factors, CFL energy saving lamp, fluorescent lamp technology is also in development, the luminous efficiency of office lighting system T5 lamp has reached 100lm/W level, CFL energy-saving lamps also have 3W specifications of ultra small products come from the current LED and energy-saving lamp price is concerned, the popularity of LED lighting still has a long way to go.

Due to the downstream packaging and application of funds and technical requirements are relatively low, currently more than 80% of the LED companies are only low-end packaging business; but the LED chip and wafer and other upstream industries due to the high technology and capital requirements, so in less business, development relative lag. Since the equipment accounted for the entire production line LED acquisition costs of nearly 2/3, which is the main reason for the LED product is difficult to reduce. January 8, 2010, the country's first independent research and development of MOCVD equipment in Guangdong letter Semiconductor Equipment Manufacturing Co., Ltd. offline, in the next 4 months after the test data will enter the stage of mass production equipment.

It is understood that the buffer distributed injection reaction chamber, the integration of ALD and CVD technology and MOCVD electric field assisted growth, is the letter of the semiconductor MOCVD equipment innovation. The BDS reaction chamber is adopted to absorb the laminar flow of the planetary reaction chamber through the combination of the central radiation flow and the vertical spray flow, so as to avoid the complex motion of the reaction chamber. The gas flow mode can accurately realize the instantaneous switching of the reaction gas, and can realize the switching of the reaction gas source from the continuous to the pulse when the flow field of the cavity is kept constant. The heating furnace adopts the infrared radiation heating mode of a plurality of zones, and each heating area can be independently controlled, so that the temperature of a large area can be uniformly controlled, and a wider range of heating temperature zones can be obtained. The control system adopts the network architecture to realize the real-time control of the sensor and the actuator. According to the different extension process, the sensitivity of the real-time is designed to ensure the repeatability and stability of the production.

Headquartered in Nanchang, the development of GaN-on-SiMOCVD crystal growth technology photoelectric, recently developed a 1 x 1mm chip cold white light LED, in the 350mA current output light more than 100 lumens. At present, most of the production of LED is the precipitation of multilayer GaN thin films on a sapphire or silicon carbide substrate, and the crystal growth of silicon substrate can think, LED play a greater potential for cost saving and control will be based on performance, and no less than the traditional production process of LED crystal optical electrical, which is based on high power InGaNLED the performance of the silicon substrate is close to the traditional substrates by LED. It is reported that the company is currently used in the field of small size display core (200micron) has entered the production stage.

With the Chinese governments at all levels to LED lighting as a new economic growth point, and China technology in the promotion, before application and package into the China foreign investors LED, began to hit the high-end technology projects. The day before, XURUI Au Optronics Co a total investment of $350 million LED epitaxial chip project foundation in Foshan City Economic Development Zone in the South China sea. Professional design and production of LED epitaxy, high brightness high-power chip, is expected in 2013 on the completion of the three phase of investment, Xu Rui will have more than 100 sets of MOCVD photoelectric machine, capable of producing 4 inch, 6 inch LED wafer and high power, high brightness LED chips at the same time, the luminous efficiency is greater than 135lm/W, full production to produce LED chip 380 million.

It is reported that XURUI photoelectric major shareholders - the United States SemiLED (SemiLEDs), is the world's only production base metal chip vertical structure of enterprise.

Compared with other LED products, metal base vertical structure LED has better electrical and thermal conductivity, can increase the brightness and luminous efficiency, belonging to the next generation of ordinary lighting LED technology.

The first application of the government is to promote the industrialization of LED lighting technology. According to the deputy director of the Shanghai Municipal Science and Technology Commission of Putuo District Li Wenbo introduced in September 2006 in Shanghai Putuo District Shanghai LED semiconductor lighting R & D center to the application of "government guidance, social participation, enterprises" operation and management mode, focus on technology research and development, testing, demonstration base and Industrial Agglomeration in the 4 aspects of work. At present, the center has successfully built a LED test platform, and actively promote the establishment and implementation of the LED standard; the successful construction of the "Suzhou river landscape lighting project", "Putuo District government courtyard lighting renovation project" and "Putuo District library interior lighting