Let EUV technology breakthrough is expected to become the next generation of chip processing technology

Xtreme Technologies GmbH, Germany claimed before in improving the power output of EUV light source beyond the target, in order to seek what will EUV lithography into chip manufacturing. Xtreme claims that in principle experiments, from the beginning of the program about 120 watts, developed a 800 Watt Power EUV light source. For the production of EUV, power output must be close to 1 kilowatts by around 2010.

EUV lithography is expected to become the next generation of chip processing technology, the use of 13 nm wavelength lumen, chip manufacturers can be printed on the integrated circuit of the size of 32 nm and smaller. Xtreme is a joint venture between Lambda Physik AG and Jenoptik. Lambda Physik shares were acquired by Japan's Ushio company in 2005. The 36 month long program, which is part of the European EUV program known as More Moore, was activated in early 2004 by the ASML company in Holland.

Despite many technical challenges, including power output and optics, EUV continues to make progress. Carl Zeiss SMT said it has provided the first set of ASML for EUV lithography optical system. ASML is developing two sets of Alpha EUV lithography tools in the second quarter, respectively, to the Belgian IMEC research center and the University of California, New York Albany nanotechnology.