Niuwei motor released for 200mm wafer exposure device and laser stripping device LED

Japan Niuwei Motor announced that it has started exposure device for supplier of LED, and LED has been successfully developed using laser stripping device. Exposure device "UX4-LEDs FFPL 200" "is the world's first" (Niuwei motor) support 200mm wafer products. Laser stripping device "UX4 - LEDs LLO150 for" from the sapphire (Al2O3) substrate stripping gallium nitride (GaN) film, reuse the sapphire substrate.

About the exposure device, was released in November 2010 of Niuwei motor device supports 150mm wafer, Japan and South Korea, Taiwan and Chinese, large LED manufacturers have been applied to the production line. The device follows the platform of the 150mm wafer device and is equipped with an optical system that supports 200mm wafers. As a result of the global double exposure method, it will not be like stepping exposure (Step and Repeat) way, the throughput decreases with the increase of diameter of the wafer, continue to maintain a throughput of 120 / hour. Resolution of 3 m, the overlap accuracy, both positive and negative are 1 m. Optional reverse stack function.

Laser stripping device, which is equipped with a high stability laser, in the exposure device developed in the ultraviolet optical technology and handling technology, to take into account the high production efficiency and stable quality. Support 150mm substrate.