SUSS MicroTec AG is a wholly owned subsidiary of HamaTech APE GmbH & Co. KG announced that MaskTrack Pro has received dozens of equipment orders. MaskTrack Pro, which was put into operation in 2009, is a complete mask process platform for next generation lithography.
For mask 22nm 193nm immersion lithography, EUVL deep ultraviolet lithography, NIL contact technology and other advanced nano imprint lithography process, MaskTrack Pro is currently the only known can realize cleaning, baking and developing steps of the equipment. MaskTrack Pro combined with physical and chemical cleaning technology, can effectively remove organic and inorganic pollutants, without damaging the mask line and material structure. MaskTrack Pro use ASonic patent technology developing unique, and advanced the post exposure bake, consistency can achieve near perfect key size, which is particularly important for the sub 22nm dual graphics technology, can calmly deal with the challenges of the future advanced lithography technology.
"Development of next generation lithography, prompting MaskTrack Pro to accelerate the development of the market. In early 2011, MaskTrack Pro will be adopted by many of the world's leading companies. HamaTech CEO Wilma Koolen-Hermkens said, we are very pleased to see that a number of customers have purchased our equipment. We hope MaskTrack Pro will become the industry's standard configuration equipment. "
"Mask complete process is the central idea of the design of Pro platform MaskTrack, to the important role of advanced lithography technology. "Executive Frank Averdung SUSS MicroTec president chief supervisor said," to work together to thank our customers and partners, we have developed a MaskTrack Pro system, in order to meet the demanding challenges of complete next generation lithography mask process. "
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