The launch of Veeco for the production of high brightness LED GaN MOCVD TurboDisc equipment K465i

Veeco TurboDisc launched K465i, a for the production of high brightness LED (HB LED) gallium nitride (GaN) metal organic chemical vapor deposition (MOCVD) equipment, after Veeco days before the user trial within the LED industry, K465i quickly obtain production approval, the company has received a number of LED users in Asia Pacific region order.

Veeco pointed out that this new product is based on the TurboDisc K465i K family Veeco platform tested, with the highest production efficiency of the industry, in the 5nm bin error range, yield the optimal LED rate close to 90%, a substantial increase in the rate of bin. TurboDisc K465i is fully automated operation, routine maintenance in a very short period of time to continue to produce action, increase production efficiency. In the competition of similar products, not only the highest production efficiency, but also save a lot of cost.

TurboDisc K465i design: uniformity and repeatability

The core of the TurboDisc GaN MOCVD K465i system is the Veeco patent pending Uniform FlowFlange technology. It is designed to produce uniform flow pattern evenly through the LED epitaxial wafer and alkyl hydride gas, LED chip of the equipment to build out can be obtained excellent uniformity and reproducibility, K465 I uses the most advanced technology of reaction furnace Veeco. Provides a quick process optimization easy debugging function to simplify the design of FlowFlange, the size is 8 inch wafer, the equipment maintenance after the rapid resumption of production capacity to ensure the highest production efficiency of LED industry.