Recently, located in Wuhan, Huazhong University of Science and Technology, Wuhan, China National Laboratory successfully completed the installation and commissioning of Vistec EBPG5000pES system. Wuhan optoelectronics National Laboratory stakeholders said, Vistec EBPG5000pES electron beam lithography system will further enhance the Wuhan National Laboratory for Optoelectronics (WNLO) R & D strength in the field of Photonics and optoelectronics. "The EBPG5000pES system enables us to cope with all the needs of today's sophisticated lithography, and we are confident that we will be able to get the support of Vistec, a strategic partner, both in terms of application and technical services. "The Vistec EBPG5000pES system is highly reliable, and the design architecture has proven to be the best electronic beam lithography tool. The system has flexible optical lens system, high brightness of field emission electron beam source, can work stably in accelerating voltage of 50KeV and 100KeV, provides a small beam spot size of 2.2nm, therefore, the minimum resolution can reach less than 8nm security structure stable repeat. At the same time, the system adopts the interactive graphical operation interface (GUI), which is very simple and easy to use in the multi user, multi user school and scientific research environment. Vistec electron beam lithography company responsible person said. "We are very happy and the Huazhong University of Science and Technology in Wuhan National Laboratory for Optoelectronics (WNLO) to achieve this milepost in the process of cooperation, convinced that Vistec can help the Huazhong University of Science and Technology National Laboratory for optoelectronics to achieve more success, Wuhan National Laboratory for optoelectronics electron beam lithography system was first installed in operation China in EBPG5000pES system, we believe that the steady growth in the future of the Vistec business in the Chinese range there will be more and more. "
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